SU-8 photoresist

Results: 17



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11Microsoft Word - revised Mousa et al supplementary information.doc

Microsoft Word - revised Mousa et al supplementary information.doc

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Source URL: microfluidics.utoronto.ca

Language: English - Date: 2011-08-09 14:23:18
12Supplementary Figures  Fig. S1. Fabrication process and dimensions of shallow and deep HCWN plates. (a) Fabrication of the PDMS base mold. For base channel fabrication, PDMS prepolymer is poured onto a two-layered SU-8 m

Supplementary Figures Fig. S1. Fabrication process and dimensions of shallow and deep HCWN plates. (a) Fabrication of the PDMS base mold. For base channel fabrication, PDMS prepolymer is poured onto a two-layered SU-8 m

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Source URL: molecularbrain.com

Language: English
13MAKING A MOLD USING SU-8 PHOTORESIST All work is done with Saurabh Vyawahare in the Princeton Microfluidics Core facility in 105 Jadwin Hall (Physics Department). Website: http://www.princeton.edu/microfluidics/ Material

MAKING A MOLD USING SU-8 PHOTORESIST All work is done with Saurabh Vyawahare in the Princeton Microfluidics Core facility in 105 Jadwin Hall (Physics Department). Website: http://www.princeton.edu/microfluidics/ Material

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Source URL: www.princeton.edu

Language: English - Date: 2013-03-28 20:26:26
14MUEGGE_Poster_MEMS-Stripping-Process_Rev02

MUEGGE_Poster_MEMS-Stripping-Process_Rev02

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Source URL: www.muegge.de

Language: English - Date: 2015-01-07 04:43:18
15www.microchem.com  SU[removed]

www.microchem.com SU[removed]

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Source URL: www.microchem.com

Language: English - Date: 2011-10-05 11:56:06
16NANO™ ANO™ SU-8 Negative Tone Photoresist

NANO™ ANO™ SU-8 Negative Tone Photoresist

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Source URL: www.microchem.com

Language: English - Date: 2011-10-05 11:56:14
17

PDF Document

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Source URL: engineering.tufts.edu

Language: English - Date: 2013-04-30 20:20:58